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CHEMICAL SOLUTIONS

FOR SOFT NANOIMPRINT LITHOGRAPHY

Some of Layer Properties


Composition: TiO2, SiO2


State: Dense or Mesoporous


Nanostructure: Periodicity < 50nm




Applications


Micro-Nano-Fabrication (microelectronics),

Texturing (hydrophobicity), Optics, Decoration, Super hydrophobic surfaces





DOWNLOAD the datasheet on the

“Chemical solutions for soft nanoimprint lithography”




This formuation enables the soft nanoimprint lithography on several substrates, including polymers by the SolGel process. This solgel layer is printed by a PDMS mold, which is itself printed by a semi-conductor matrix. This formulation is low cost, very easy to use and can be adapted to specific surface requirements.

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